【CITPV】SILEX_GENERIS PVD-solarbe文库

资源描述：

SINGULUS TECHNOLOGIESSingulus 湿法设备和 PVD设备在 HJT的应用韩美洲2019-09-06 杭州 SINGULUS TECHNOLOGIES AG 05-2018 - 2 - Outline 1 SINGULUS TECHNOLOGIES AG-公司介绍2 HJT Solar Cell Process Flow-异质结电池工艺流程4 GENERIS PVD磁控溅射设备3 SILEX II CLEANTEX-臭氧制绒湿法设备 SINGULUS TECHNOLOGIES AG 05-2018 - 3 - History SINGULUS TECHNOLOGIES FoundationSINGULUS TECHNOLOGIESErnst Leybold started his business in CologneCompany building 1860 19661851 1860 1967 1995LEYBOLD HERAEUSVacuum Technology, Metallurgy and Coating Unicorn Pharmacy was founded 1600 in HanauW.C. Heraeus took over business in 1851 and started with platinum 1851 MergerLEYBOLD / BALZERS 1966 E. Leybold Successor 1966 Heraeus Hochvakuum founded 1995 2007Acquisition SINGULUS STANGL SOLAR GmbHSingulus公司成立 1995年，技术前身是莱宝科技 -真空镀膜的鼻祖 SINGULUS TECHNOLOGIES AG 2019- 4 - Confidential HeadquarterKahl am Main, Germany Production Site Fürstenfeldbruck Munich, GermanyFranceSausheim Latin AmericaSao Paulo China GuangzhouAsia Pacific Singapore Taiwan TaipeihLegendSubsidiaries/Sales ServicesHeadquarterProduction Site FürstenfeldbruckAgents SINGULUS TECHNOLOGIESSubsidiaries Agents Worldwide China ShanghaiSingulus 全球的分布 SemiconductorOver 180Systems installed PhotovoltaicCrystaline and CISG ,CdTeOptical DiscOver 8.550systems installed Medical TechnologyMarket entry 2017First order received Consumer GoodsOver 20Systems installedEast CoastHeadquarter US, HartfordWest CoastSales and Service West Coast SINGULUS TECHNOLOGIES AG 05-2018 - 5 - SINGULUS TECHNOLOGIES Main Bussiness半导体医疗光伏装饰镀膜 SINGULUS TECHNOLOGIES AG 05-2018 - 6 - SINGULUS TECHNOLOGIES Headquarters in Kahl/Germany总部所在地 -法兰克福 SINGULUS TECHNOLOGIES AG 05-2018 - 7 - Diversity of SINGULUS Sputtering ToolsSINGULUS GENERIS NDT DECOLINEVISTARISGen I Gen II Gen III HJT ROTARISTIMARISSingulus生产的 PVD各种应用总台数超过8000台 SINGULUS TECHNOLOGIES AG 05-2018 - 8 - SINGULUS TECHNOLOGIES Manufacturing Location in Fürstenfeldbruck/Germany德国慕尼黑工厂 -专门湿法设备生产 SINGULUS TECHNOLOGIES AG 05-2018 - 9 - Outline 4 GENERIS PVD3 SILEX II CLEANTEX1 SINGULUS TECHNOLOGIES AG2 HJT Solar Cell Process Flow SINGULUS TECHNOLOGIES AG 05-2018 - 10 - Texturing/cleaning a-Si Fr./Re. TCOFr./Re. Printing Fr./Re. HJT Solar Cell Process Flow GENERIS PVD SILEX IISingulus 提供 4步工艺中的 2步工艺设备 SINGULUS TECHNOLOGIES AG 05-2018 - 11 - Outline 2 HJT Solar Cell Process Flow4 GENERIS PVD3 SILEX II CLEANTEX1 SINGULUS TECHNOLOGIES AG SINGULUS TECHNOLOGIES AG 05-2018 - 12 - SILEX II CLEANTEX Batch platform for advanced texturing/cleaning Batch size 400 wafers e.g. M2-M4-M6 Throughput 6400/8000 wph gross SILEX II CLEANTEX6400/ 8000 湿法设备 -大产能 8000片 /小时一台 ----特别适合 GW级扩产 SINGULUS TECHNOLOGIES AG 05-2018 - 13 - Cleaning procedures for HJTNH 4OH H2O2 SDR Tex NH4OH H2O2 HF HNO3 HCl H2O2 HF DryDIO 3 SDR Tex DIO3 HF HF DryRCAO3 Preclean PostcleanStructuring ConditioningSC1 SC1 SC2先进臭氧工艺工艺创新 SINGULUS TECHNOLOGIES AG 05-2018 - 14 - Cleaning procedures for HJTNH 4OH H2O2 SDR Tex NH4OH H2O2 HF HNO3 HCl H2O2 HF DryDIO 3 SDR Tex DIO3 HF HF DryRCAO3 Preclean PostcleanStructuring ConditioningSC1 SC1 SC2 No NH4OH, H2O2 or HNO3 不再含氨水，硝酸，双氧水环评方便 SINGULUS TECHNOLOGIES AG 05-2018 - 15 - Advantage 1 清洗效果 -工业化验证 Moldovan et al. FhG ISE on PVSEC-26，Oct. 2016清洗影响 1.是否清洗干净2.是否影响电池效率创新驱动力 p经济性要求p环保要求 SINGULUS TECHNOLOGIES AG 05-2018 - 16 - Advantage 2 臭氧机 -Singulus自己开发 Singulus 自己开发的臭氧机 -满足大容量消耗的需求 SINGULUS TECHNOLOGIES AG 05-2018 - 17 - €- €50,000.00 €100,000.00 €150,000.00 €200,000.00 €250,000.00 €300,000.00 H2O2 KOH NH4OH Additive HNO3 DI-Water Power HF HCl CDA N2 O2 2800-RCA2800-O3195万元155万元63万元8万元Δ 571 k€/a 417万元/年 100MW RCA 100MW O3H2O2 266.992,19 € - € KOH 263.813,71 € 264.657,12 € NH4OH 211.686,66 € - € Additive 171.478,91 € 172.027,13 € HNO3 86.319,53 € - € DI-Water 58.801,85 € 58.989,84 € Power 38.380,13 € 35.712,77 € HF 38.022,55 € 39.459,42 € HCl 18.117,33 € 7.573,02 € CDA 4.529,33 € 4.543,81 € N 2 1.152,20 € 1.036,31 € O2 - € 3.826,37 € Total 1.159.294,37 € 587.825,78 € 846万元429万元10 MW RCA10 MW O 3 Advantage 3 Chemical Consumption-运行成本节约每年省 417万化学品的消耗 SINGULUS TECHNOLOGIES AG 05-2018 - 18 - Advantage 4 Disposal-污水处理问题太湖/无锡，2017年9月 SINGULUS TECHNOLOGIES AG 05-2018 - 19 - Advantage 4 Disposal-污水处理成本节约 O 3 vs. RCAà No N-containing disposalà Saving of waste treatment costà No eutrophication 无水体富营养化100MW-RCA 100MW-O3NH4-containing 3 6 8 m3 0NO3-1-containing 7 2 m3 0 Cost difference RMB 170万NH4 氨氮NO3- 硝氮 SINGULUS TECHNOLOGIES AG 05-2018 - 20 - Advantage 5 大产能设备臭氧工艺 Amortization 10 years SILEX II CLEANTEXConfiguration 100MW RCA2800 wph 100MW O32800 wph 250MW O36400 wphTotal CoO* €/wafer 0.067 0.040 0.036总体拥有成本*人民币/片5角3角2角7分成本节省- -41 -478000片产能和臭氧工艺 ---进一步降低运行成本 SINGULUS TECHNOLOGIES AG 05-2018 - 21 - Outline 2 HJT Solar Cell Process Flow4 GENERIS PVD1 SINGULUS TECHNOLOGIES AG3 SILEX II CLEANTEX SINGULUS TECHNOLOGIES AG 05-2018 - 22 - GENERIS PVD Overview-PVD介绍在线镀膜设备 ITO – 透明导电层金属化镀膜 SINGULUS TECHNOLOGIES AG 09-2018 - 23 - GENERIS PVD-模块化的设计 SINGULUS TECHNOLOGIES AG 09-2018 - 24 - PROCESS FLOW INLINE Double Sidewith CRS for GENERIS 6000 10000 Transfer3 Loading /Unloadingof Wafers Decreasing of pressure Increasing of pressure Process pressure 2-5 x10-3 mbarBase pressure2x 10-6 mbar Sputterchamber withmultipurpose Process Carrier Return System ExitBuffer 2Extension1 Prozess Extension2Load Buffer 1 SINGULUS TECHNOLOGIES AG 05-2018 - 25 - 降本要求 6000片每小时或 10000片每小时 SINGULUS TECHNOLOGIES AG 05-2018 - 26 - 关键点 -自动化上下料机 -非常的关键Flexible Loading/Unloading ConfigurationLoading/unloadingLoading Unloading Loading/unloading single-side and double-side available Fexible choice according to factory and automation layout Contactless grip of wafers for minimal surface damage SINGULUS TECHNOLOGIES AG 05-2018 - 27 - 关键点载盘 -M2/M4/M6 SINGULUS TECHNOLOGIES AG September 2017- 28 - confidentialTemperature Uniformity /- 5§ Fast Heat-up / switch on-off at Buffer chamber 1§ Static heating for excellent temperature uniformity§ Keeping temperature process chamber关键点 -温度稳定性Temperature Homogeneity und Stability SINGULUS TECHNOLOGIES AG 05-2018 - 29 - 关键点 -上下镀膜模块随时切换Flexible Choice of Deposition OrderPower supply Cathod Cathod blocks are all lifted up in maintanence. Cathod blocks for top-down and bottom-up coating can be easily exchanged. SINGULUS TECHNOLOGIES AG 05-2018 - 30 - 关键点 --带气体隔离模块Separation of Deposition Processes Gas separation unit is available Coating processes for top-down and bottom-up can be adjusted independently. Maximal degree of freedom for process optimization and upgradeTop-down coating Bottom-up coatingGas separation unit工艺窗口更宽